Franklin

Materials, processes, integration and reliability in advanced interconnects for micro- and nanoelectronics [electronic resource] / editors: Qinghuang Lin ... [et al.].

Publication:
Warrendale, Pa. : Materials Research Society, c2007.
Series:
MRS proceedings ; v. 990
MRS proceedings ; v. 990
Format/Description:
Book
xiv, 338 p. : digital, PDF fil
Subjects:
Interconnects (Integrated circuit technology) -- Congresses.
Integrated circuits -- Very large scale integration -- Congresses.
Microelectronics -- Congresses.
Nanoelectronics -- Congresses.
Materials -- Congresses.
System Details:
Mode of access: World Wide Web.
Notes:
Title from home page (viewed May 5, 2008).
"Published proceedings articles from Symposium B from the 2007 MRS Spring Meeting."
Issued as part of the MRS online proceedings library.
Includes bibliographical references.
Contributor:
Lin, Qinghuang, 1963-
Materials Research Society. Meeting (2007 : San Francisco, Calif.). Symposium B.
ISBN:
9781558999503
1558999507
OCLC:
173995812
Access Restriction:
Restricted for use by site license.
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