Franklin

Environmental, safety, and health issues in IC production [electronic resource] : symposium held December 4-5, 1996, Boston, Massachusetts, U.S.A. / editors, Rafael Reif ... [et al.].

Publication:
Pittsburgh, Pa. : Materials Research Society, 1997.
Conference Name:
Symposium on Environmental, Safety, and Health (ESH) Issues in IC Production (1996 : Boston, Mass.)
Series:
Materials Research Society symposia proceedings ; 0272-9172 v. 447.
Materials Research Society symposia proceedings ; v. 447
Format/Description:
Conference/Event
Book
1 online resource (ix, 154 p.) : ill.
Subjects:
Semiconductor industry -- Safety measures -- Congresses.
Integrated circuits industry -- Safety measures -- Congresses.
Manufacturing processes -- Safety measures -- Congresses.
Green technology -- Congresses.
Form/Genre:
Boston (Mass., 1996)
System Details:
Mode of access: World Wide Web.
Contents:
In situ monitoring of HF reprocessing in an industrial scale recirculator bath / A.J. Reddy ... [et al.]
Anhydrous HF processing as an alternative to HF/water processes / J. Staffa ... [et al.]
Minimization of DI water consumption in wet clean rinse tanks / J. Cook
The implementation of dilute chemistries in semiconductor manufacturing / Ron Sanders, Fuyu Lin, and Pat Schay
*PFC emission control options for plasma processing tools : a current assessment / M.T. Mocella
Perhalogenated organic byproducts from plasma etching processes and their effects on human health and environmental impact / S. Bauer and I. Wolff
Environmental issues of perfluorocompounds in the semiconductor industry / Jeffrey D. Williams
Effectiveness of an inwardly fired burner on abatement of PFCs / A.M. Pierce and J. Van Gompel
Gas stream analysis and PFC recovery in a semicomductor process / J.A.B. Van Hoeymissen ... [et al.]
An integrated approach for the safe handling of hydrides / J.R. Shealy ... [et al.]
Plasma etching of silicon dioxide and silicon nitride with nonperfluorocompound chemistries : trifluoroacetic anhydride and iodofluorocarbons / Simon M. Karecki, Laura C. Pruette, and L. Rafael Reif
Next generation processes and equipment that leads to positive environment, safety, and health impacts / Phyllis Pei and H. Ray Kerby
Parallel downflow rinse ; water saving technology in water rinse / Y. Hiratsuka and N. Fujikawa
A technique for measuring slurry-flow dynamics during chemical mechanical polishing / J. Coppeta ... [et al.]
A plasma reactor for solid waste treatment on PECVD production systems / S. Raoux ... [et al.]
Measurement of arsenic emission from doped Czochralski silicon crystal growing operation / D. Sinha ... [et al.]
*Chlorine precursors for gate oxidation processes / M.J. McGeary ... [et al.]
Photoresist polymer mask formed from aqueous phase via polymerization in a two-dimensional surfactant template / P.D. Newman, G.K. Newman, and J.H. Harwell
An integrated chemical-microbiological approach for the disposal of waste thin-film cadmium telluride photovoltaic modules / K.M. Paknikar ... [et al.]
Point-of-use silicon sources for CVD / D.A. Saulys ... [et al.]
Safe precursor gas for broad replacement of SiH₄ in plasma processes employed in integrated circuit production / M.J. Loboda ... [et al.].
Notes:
Includes bibliographical references and index.
Electronic reproduction. [S.l.] : HathiTrust Digital Library, 2010.
Description based on print version record.
Contributor:
Reif, Rafael.
Materials Research Society. Meeting (1995 : Boston, Mass.). Symposium L.
Other format:
Print version: Environmental, safety, and health issues in IC production.
ISBN:
1558993517
9781558993518
OCLC:
645774324
Access Restriction:
Restricted for use by site license.
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