Franklin

Atomic layer deposition : principles, characteristics, and nanotechnology applications / Tommi Kääriäinen, David Cameron, Marja-Leena Kääriäinen, and Arthur Sherman.

Author/Creator:
Kääriäinen, Tommi.
Edition:
2nd Edition.
Publication:
Salem, Massachusetts : Scrivener Publishing, [2013]
Format/Description:
Book
xv, 253 pages : illustrations ; 25 cm
Subjects:
Chemical vapor deposition.
Epitaxy.
Microelectronics.
Nanotechnology.
Notes:
Includes bibliographical references and index.
Contributor:
Cameron, David, 1949-
Kääriäinen, Marja-Leena.
Sherman, Arthur, 1931-
Other format:
Online version: Kääriäinen, Tommi. Atomic layer deposition
ISBN:
9781118062777 (cloth : alk. paper)
1118062779 (cloth : alk. paper)
OCLC:
841199208
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