Franklin

Surface contamination and cleaning [electronic resource] / editor, K.L. Mittal.

Publication:
Utrecht ; Boston : VSP, 2003-
Conference Name:
International Symposium on Surface Contamination and Cleaning (2001 : Newark, N.J.)
Format/Description:
Conference/Event
Book
1 online resource (373 p.)
Subjects:
Surface contamination -- Congresses.
Form/Genre:
Electronic books.
Language:
English
Summary:
This work constitutes the proceedings of the International Symposium on Surface Contamination and Cleaning, held in 2001. It contains a total of 24 papers, covering topics such as: mapping of surface contaminants; acceptable cleanliness levels; ionic contamination; and particle removal.
Contents:
Contents; Preface; Mapping of surface contaminants by tunable infrared-laser imaging; Monitoring cleanliness and defining acceptable cleanliness levels; Tracking surface ionic contamination by ion chromatography; A new method using MESERAN technique for measuring surface contamination after solvent extraction; Methods for pharmaceutical cleaning validations; Influence of cleaning on the surface of model glasses and their sensitivity to organic contamination; Decontamination of sensitive equipment; The fundamentals of no-chemistry process cleaning
Development of a technology for generation of ice particlesCleaning with solid carbon dioxide pellet blasting; Development of a generic procedure for modeling of waterjet cleaning; Experimental and numerical investigation of waterjet derusting technology; Practical applications of icejet technology in surface processing; Correlating cleanliness to electrical performance; Qualifying a cleaning system for space flight printed wiring assemblies; Investigation of modified SC-1 solutions for silicon wafer cleaning
Performance qualification of post-CMP cleaning equipment in a semiconductor fabrication environmentSpatial and temporal scales in wet processing of deep submicrometer features; Microdenier fabrics for cleanroom wipers; Fine particle detachment studied by reflectometry and atomic force microscopy; Dust removal from solar panels and spacecraft on Mars; Laser cleaning of silicon wafers: Prospects and problems; Particle removal using resonant laser detachment; The future of industrial cleaning and related public policy-making
Notes:
Description based upon print version of record.
Includes bibliographical references.
Contributor:
Mittal, K. L., 1945-
ISBN:
0-429-08796-9
1-280-46543-3
9786610465439
1-4175-7784-3
90-474-0328-2
1-60119-232-0
OCLC:
191039429
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