Franklin

Optical microlithography XXII : 24-27 February 2009, San Jose, California, United States

Publication:
[Place of publication not identified] SPIE 2009
Series:
Proceedings of SPIE Optical microlithography XXII
Format/Description:
Book
Subjects:
Integrated circuits -- Masks -- Congresses.
Microlithography -- Congresses.
X-ray lithography -- Congresses.
Manufacturing processes -- Congresses.
Language:
English
Notes:
Bibliographic Level Mode of Issuance: Monograph
Contributor:
Dusa, Mircea V Contributor
Levinson, Harry J Contributor
SPIE (Society) Content Provider
International SEMATECH Content Provider
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