Advances in resist technology and processing IX : 8-12 March 1992, San Jose, California, United States / editor, Anthony E. Novembre ; sponsored by SPIE.

Publication:

Bellingham, Washington : SPIE, 1992.

Series:

Proceedings of SPIE--the International Society for Optical Engineering ; Volume 1672.
Proceedings of SPIE ; Volume 1672

Format/Description:

Book
1 online resource (684 pages).

Subjects:

Photoresists -- Congresses.
Microlithography -- Congresses.

Form/Genre:

Electronic books.

Notes:

Description based on: online resource; title from title screen (SPIE Digital Library, viewed November 7, 2018).

Contributor:

Novembre, Anthony E., editor.
Society of Photo-optical Instrumentation Engineers, sponsoring body.

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