Franklin

Advances in resist technology and processing XVI : microlithography '99 : 14-19 March 1999, Santa Clara, CA, United States / editor, Will Conley ; sponsored by SPIE.

Publication:
Bellingham, Washington : SPIE, 1999.
Series:
Proceedings of SPIE--the International Society for Optical Engineering ; Volume 3678.
Proceedings of SPIE ; Volume 3678
Format/Description:
Book
1 online resource (xv, 1402 pages).
Subjects:
Photoresists -- Congresses.
Photolithography -- Congresses.
Form/Genre:
Electronic books.
Notes:
Description based on: online resource; title from title screen (SPIE Digital Library, viewed October 24, 2018).
Contributor:
Conley, Willard, editor.
Society of Photo-optical Instrumentation Engineers, sponsoring body.
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