Advances in resist technology and processing XV : 23rd annual International Symposium on Microlithography : 22-27 February 1998, Santa Clara, CA, United States / editor, Will Conley ; sponsored by SPIE.
- Publication:
- Bellingham, Washington : SPIE, 1998.
- Format/Description:
- Conference/Event
Book
1 online resource (820 pages). - Conference Name:
- International Symposium on Microlithography (23rd : 1998 : Santa Clara, Calif.)
- Series:
- Proceedings of SPIE--the International Society for Optical Engineering ; Volume 3333.
Proceedings of SPIE ; Volume 3333 - Status/Location:
-
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Details
- Subjects:
- Photoresists -- Congresses.
Photolithography -- Congresses. - Form/Genre:
- Electronic books.
- Notes:
- Description based on: online resource; title from title screen (SPIE Digital Library, viewed October 24, 2018).
- Contributor:
- Conley, Will, editor.
Society of Photo-optical Instrumentation Engineers, sponsoring body.