Franklin

Advances in resist technology and processing XV : 23rd annual International Symposium on Microlithography : 22-27 February 1998, Santa Clara, CA, United States / editor, Will Conley ; sponsored by SPIE.

Publication:
Bellingham, Washington : SPIE, 1998.
Format/Description:
Conference/Event
Book
1 online resource (820 pages).
Conference Name:
International Symposium on Microlithography (23rd : 1998 : Santa Clara, Calif.)
Series:
Proceedings of SPIE--the International Society for Optical Engineering ; Volume 3333.
Proceedings of SPIE ; Volume 3333
Status/Location:
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Details

Subjects:
Photoresists -- Congresses.
Photolithography -- Congresses.
Form/Genre:
Electronic books.
Notes:
Description based on: online resource; title from title screen (SPIE Digital Library, viewed October 24, 2018).
Contributor:
Conley, Will, editor.
Society of Photo-optical Instrumentation Engineers, sponsoring body.