Franklin

Photomask and X-ray mask technology II : 20-21 April 1995, Kawasaki City, Kanagawa, Japan

Publication:
[Place of publication not identified] SPIE 1995
Format/Description:
Book
Series:
Proceedings / SPIE--the International Society for Optical Engineering Photomask and X-ray mask technology II
Status/Location:
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Details

Subjects:
Integrated circuits -- Congresses -- Masks.
X-ray lithography -- Congresses.
Microlithography -- Congresses.
Language:
English
Notes:
Bibliographic Level Mode of Issuance: Monograph
Contributor:
Yoshihara, Hideo Contributor
BACUS (Technical group) Content Provider
Photomask Japan Content Provider
Society of Photo Optical Instrumentation Engineers Content Provider