Franklin

Metrology, inspection, and process control for microlithography XXIX : 23-26 February 2015, San Jose, California, United States / Jason P. Cain, Martha I. Sanchez, editors ; sponsored by SPIE.

Publication:
Bellingham, Washington : SPIE, 2015.
Conference Name:
Metrology, Inspection, and Process Control for Microlithography (Conference) (29th : 2015 : San Jose, Calif.)
Series:
Proceedings of SPIE--the International Society for Optical Engineering ; 0277-786X. Volume 9424.
Proceedings of SPIE ; Volume 9424
Format/Description:
Conference/Event
Book
1 online resource (265 pages).
Subjects:
Integrated circuits -- Inspection -- Congresses.
Integrated circuits -- Measurement -- Congresses.
Microlithography -- Congresses.
Form/Genre:
Electronic books.
Notes:
Description based on: online resource; title from pdf title page (SPIE Digital Library, viewed November 22, 2018).
Contributor:
Sanchez, Martha I., editor.
Cain, Jason P., editor.
Society of Photo-optical Instrumentation Engineers, sponsoring body.
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