Metrology, inspection, and process control for microlithography XXIX : 23-26 February 2015, San Jose, California, United States / Jason P. Cain, Martha I. Sanchez, editors ; sponsored by SPIE.

Publication:

Bellingham, Washington : SPIE, 2015.

Conference Name:

Metrology, Inspection, and Process Control for Microlithography (Conference) (29th : 2015 : San Jose, Calif.)

Series:

Proceedings of SPIE--the International Society for Optical Engineering ; 0277-786X. Volume 9424.
Proceedings of SPIE ; Volume 9424

Format/Description:

Conference/Event
Book
1 online resource (265 pages).

Subjects:

Integrated circuits -- Inspection -- Congresses.
Integrated circuits -- Measurement -- Congresses.
Microlithography -- Congresses.

Form/Genre:

Electronic books.

Notes:

Description based on: online resource; title from pdf title page (SPIE Digital Library, viewed November 22, 2018).

Contributor:

Sanchez, Martha I., editor.
Cain, Jason P., editor.
Society of Photo-optical Instrumentation Engineers, sponsoring body.

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