Franklin

Advances in resist technology and processing II : 11-14 March 1985, Santa Clara, California, United States / editor, Larry F. Thompson ; sponsored by SPIE.

Publication:
Bellingham, Washington : SPIE, 1985.
Series:
Proceedings of SPIE--the International Society for Optical Engineering ; Volume 539.
Proceedings of SPIE ; Volume 539
Format/Description:
Book
1 online resource (350 pages).
Subjects:
Photoresists -- Congresses.
Form/Genre:
Electronic books.
Notes:
Description based on: online resource; title from title screen (SPIE Digital Library, viewed November 7, 2018).
Contributor:
Thompson, Larry F., editor.
Society of Photo-optical Instrumentation Engineers, sponsoring body.
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