Franklin

Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies V : 1986 microlithography conferences : 10-12 March 1986, Santa Clara, United States / editor, Phillip D. Blais ; sponsored by SPIE.

Publication:
Bellingham, Washington : SPIE, 1986.
Series:
Proceedings of SPIE--the International Society for Optical Engineering ; Volume 0632.
Proceedings of SPIE ; Volume 0632
Format/Description:
Book
1 online resource (vi, 272 pages).
Subjects:
X-ray lithography -- Congresses.
Ion beam lithography -- Congresses.
Form/Genre:
Electronic books.
Notes:
Description based on: online resource; title from title screen (SPIE Digital Library, viewed November 7, 2018).
Contributor:
Blais, Phillip D., editor.
Society of Photo-optical Instrumentation Engineers, sponsoring body.
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