Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies V : 1986 microlithography conferences : 10-12 March 1986, Santa Clara, United States / editor, Phillip D. Blais ; sponsored by SPIE.

Publication:

Bellingham, Washington : SPIE, 1986.

Series:

Proceedings of SPIE--the International Society for Optical Engineering ; Volume 0632.
Proceedings of SPIE ; Volume 0632

Format/Description:

Book
1 online resource (vi, 272 pages).

Subjects:

X-ray lithography -- Congresses.
Ion beam lithography -- Congresses.

Form/Genre:

Electronic books.

Notes:

Description based on: online resource; title from title screen (SPIE Digital Library, viewed November 7, 2018).

Contributor:

Blais, Phillip D., editor.
Society of Photo-optical Instrumentation Engineers, sponsoring body.

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