Franklin

Advances in imaging and electron physics. Volume 170 [electronic resource] / edited by Peter W. Hawkes.

Edition:
1st ed.
Publication:
Amsterdam : Elsevier/Academic Press, 2012.
Series:
Advances in imaging and electron physics, 1076-5670 ; v. 170
Format/Description:
Book
1 online resource (289 p.)
Subjects:
Electrons.
Image processing.
Electronics.
Electron microscopes -- Design and construction.
Field ion microscopes -- Design and construction.
Form/Genre:
Electronic books.
Language:
English
Summary:
Advances in Imaging and Electron Physics merges two long-running serials--Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. This series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.Key features: * Contributions from leading authorities * Informs and upda
Contents:
Front Cover; Advances in Imaging and Electron Physics; Copyright; Table of Contents; Preface; Contributors; Future Contributions; 1 Precession Electron Diffraction; 1. Introduction; 2. Precession Electron Diffraction: Geometry and Diffracted Intensities; 2.1. The Geometry of Precession Electron Diffraction; 2.2. Geometric Correction; 2.3. Practicalities; 2.4. How Kinematical are PED Intensities?; 3. Structure Solution Using Precession Electron Diffraction; 3.1. Patterson Transforms; 3.2. Direct Methods; 3.3. Charge-Flipping Algorithms; 3.4. Solving Precession Electron Diffraction Data
4. Applications and New Developments of PED4.1. Solving Crystal Structures; 4.1.1. Inorganic Materials; 4.1.2. Zeolites; 4.1.3. Organic Crystals; 4.2. Other Crystal Information; 4.3. Technical Applications; 4.3.1. Automated Diffraction Tomography; 4.3.2. Rotation Method and Digital Sampling; 4.3.3. Orientation Mapping; 5. Conclusions; Acknowledgments; References; 2 Scanning Helium Ion Microscopy; 1. Introduction; 2. Scanning Helium Ion Microscope; 2.1. Helium Ion Source; 2.1.1. Historical Background; 2.1.2. Principles of Operation; 2.1.3. Source Properties; 2.1.3.1. Best Image Voltage
2.1.3.2. Beam Current Stability2.1.3.3. Source Maintenance and Lifetime; 2.1.3.4. Brightness; 2.1.3.5. Energy Spread; 2.2. Column; 2.2.1. Design Considerations; 2.2.2. Probe Size Performance; 2.3. Beam/Sample Interactions; 2.3.1. Interaction Volume; 2.3.2. Sample Damage; 2.3.3. Sample Charge Control; 2.4. Particles and Detectors; 2.4.1. Secondary Electrons; 2.4.2. Backscattered Helium; 2.4.3. Transmitted Helium; 2.4.4. Other Signals; 3. Applications; 3.1. Imaging; 3.1.1. High-Resolution Imaging; 3.1.2. Imaging of Biological Systems; 3.1.3. Imaging of Polymers; 3.2. Nanomachining
3.2.1. Ion Milling3.2.2. Beam-Induced Chemistry; 3.2.3. Lithography; 4. Future Developments; 5. Conclusion; Acknowledgments; References; 3 Signal Reconstruction Algorithm Based on a Single Intensity in the Fresnel Domain; 1. Introduction; 2. Theory; 3. The Recursive Algorithm; 4. Numerical Results; 5. Conclusions; Acknowledgments; References; 4 Electron Microscopy Studies on Magnetic L10-Type FePd Nanoparticles; 1. Introduction; 2. Experimental Procedures; 2.1. Sample Preparation; 2.2. Transmission Electron Microscopy (TEM); 2.3. Quantitative Electron Diffraction Intensity Analysis
2.4. Electron Tomography2.5. Magnetic Property Measurements; 3. Atomic Ordering and Hard Magnetic Properties; 3.1. Atomic Ordering and Morphology of FePd Nanoparticles; 3.2. Hard Magnetic Properties due to Atomic Ordering; 3.3. Analyses of Magnetic Properties; 4. Determination of Order Parameter by Electron Diffraction; 4.1. Definition of LRO; 4.2. Particle Morphology and Alloy Composition Distribution; 4.3. Beam Incidence and Thickness Dependence of I110/I220 Intensity Ratio; 4.4. Evaluation of Particle Thickness; 4.5. Determination of the LRO parameter of Individual Nanoparticles
5. Atomic Structure Imaging of Nanoparticles
Notes:
Description based upon print version of record.
Includes bibliographical references and index.
Contributor:
Hawkes, P. W.
ISBN:
1-283-43423-7
9786613434234
0-12-397843-2
OCLC:
775872726
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